21/09/2017
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Engineering and Science>High Vacuum Technology >
Vacuum RF & DC Magnetron Sputtering System (Model: MSS)

  

Specifications:

·        Steel Chamber Volume: 60 Liters

·        Final Pressure: 10-6 mbar

·        Vacuum System:

                 Mechanical & Turbomolecular Pumps

·        Operation:

                Semiautomatic with Electrical Power

                 Water, Pressurized Air and Operator Malfunction Protection

·        Chamber Lid Lifting Mechanism: Pneumatic

Main Accessories:

·        Magnetron Sputtering Cathode; 3" and 2" Targets(as ordered )

·        1KW DC Power Supply

·        600 W RF Power Supply at 13.56 MHz

·        Automatic and Manual Matching Box

·        Computerized Thickness Monitoring for each Cathode

·        Manual Sample Holder

·        Station Shutter with Manual Control

·        Sample Shutter with Manual Control

·        Local Plasma Cleaning Cathode

 
Our offerings :
Finished Product
Custom Production
Commissioning
Repair
Maintenance
Retrofit/ Upgrading
Training

The ACECR affiliate in charge:
Sharif University of Technology Branch
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Sectors:
Petroleum Industry
Rail Transportation
Biotechnology
Power Generation
Renewable Energy
 
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