21/09/2017
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Engineering and Science>High Vacuum Technology >
Magnetron Sputtering Cathode





 
 
 
 
 

Specifications

              ·        1000 Watts Power

              ·        2" & 3" Target

               ·        Circular Planar                              Magnetron

              ·        for RF & DC                                 Sputtering

 

 

The Magnetron Sputtering Cathode has been optimized and upgraded by means of finite element method using commercial code “ANSYS”. By this optimization, we have achieved 56% for target utilization and 16 nm/s of deposition rate, as the most important parameters, for 3 Inches Magnetron Sputtering Cathode.

This Magnetron Sputtering Cathode is easy installation both for DC & RF Regimes.

Our offerings :
Finished Product
Custom Production
Commissioning
Repair
Maintenance
Retrofit/ Upgrading
Training

The ACECR affiliate in charge:
Sharif University of Technology Branch
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